Quartz wafer

We offer Glass and Quartz Wafers of the UV, optical and semiconductor grade. Its basic applications are:

  • laser optics,
  • sensors,
  • high frequency circuits,
  • optical windows and lenses.

Quartz crystals are formed thanks to hydrothermal synthesis. Production takes place in a thick pressure vessel in thermal jacket and heating coils. The first step is to add crushed feeding quartz and filling the vessel with NaOH solution. The quartz seed crystals are suspended from the top. The NaOH solution is heated to a temperature of over 300 °C  and pressure >1000 bars. Quartz crystals can reach large sizes and weight up to several kilograms, then they are cut („X-Cut“, „Y-Cut“, „AT-Cut“, and „ST-Cut“) and polished.

Quartz Wafer Specifications

Thickness range 0.5 mm, 1.0 mm , other thicknesses down to 0.1 mm on request
Thickness tolerance +/-5%
Orientation X-Cut, Y-Cut, AT-Cut, ST-Cut
Surface finishing double/single sided polishing
Diameter ranging 2”,3”,4”,6”,8”
Grade UV, optical, semiconductor
Resistivity 7x 10 7 Ohm-cm
Roughness Ra < 0.5 nm
Rq < 1.0 nm
Rt < 2.0 nm
Refractive index 1.458

PhotonExport provide a selection of specialty glass wafers that can be custom fabricated to reach your specific application requirements.

Corning ®Gorilla® Glass – this is an aluminum-silicon glass, is more mechanically and chemically resistant than other glass substrates.

Borofloat® – has a good mechanical strength, thermal and chemical resistance, has a high degree of transparency.

Borosilicate – the fundamental components of borosilicate glass are silica and boron oxide which provide a very low coefficient of thermal expansion, resulting in the glass being more resistant to thermal shocks than other standard glass substrates.

Soda ­– lime –  also known as soda-lime-silica glass, can be chemically strengthened in order to increase its mechanical strength or it can heat strengthened/tempered to increase thermal shock, resistance and mechanical strength. It is one of the most common types of glass in the world.

Eagle XG® – good chemical resistance, smooth surface and low density are the main parameters characterizing this type of glass.

SAPPHIRE WAFER

PhotonExport provides high quality wafers made of monocrystalline Sapphire. Crystals can be obtained by several techniques, among others Czochralski method, Kyropolos, Heat Exchanger (HEM) and Verneuil method.  Its specific properties such as:

  • Anti-corrosion properties
  • Stable dielectric constant
  • Good light transmission
  • High working temperature
  • Uniform crystal lattice

allows the use of wafers in many branches of industry like automotive, commercial lightning.

You can see the product specifications below

Sapphire Wafer Specifications

Thickness range 0.5 mm, 1.0 mm
Thickness tolerance +/-5%
Orientation C-axis, M-axis, A-axis, R-axis
Surface finishing double/single sided polishing
Diameter ranging 1″,2”,3”,4”,6”
Crystal Growth Kyropolos, HEM, Verneuil, CZ
Roughness Ra < 0.5 nm
Refractive index 1.768
Hardness 9

Small quantities or individually packed wafers are available.

Should you need any further information or you are interested in other product parameters, please do not hesitate to contact us: info@waferexport.com or TOLL FREE in Spain (+34) 900 838 909, Portugal (+351) 800 180 183 or France +33 805 080 082.

Read about more products we offer: Silicon WaferIndium Phosphide , Thermal Oxide, SOI/SIlicon On Insulator, Silicon Nitride.