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We can obtain Silicon wafers by 3 basic methods: Cz (Czochralski method) MCZ (Magnetic Field Applied Czochralski) FZ (Float Zone) First method allows us to make wafers of a single crystal sili
The production of Thermal Oxide Wafer is based on a process called thermal oxidation. This is the way to produce thin layers of oxide - most often silicon dioxide - on the wafers. This technique co...
SOI/Silicon on Insulator Crystal Wafer technology uses a composite substrate: active silicon layer-insulator-bulk silicon (handle layer). In consequence, we improve performance and reduce parasitic ca
We offer Glass Wafers and Quartz Wafers of the UV, optical and semiconductor grade. Its basic applications are: laser optics, sensors, high frequency circuits, optical windows and lenses. Qu