What is Silicon nitride?
Si3N4 is characterized by high creep, oxidation and high temperature resistance, low coefficients of thermal expansion, which is related to the good resistence to thermal shocks. WaferExport provides the best Silicon nitride (SN) Wafers .
We offer SI3N4 in three varietes: Hot Pressed SN (HPSN), Reaction Bonded SN (RBSN) and Sintered SN (SSN).
What are two methods used to deposit a low-stress silicon nitride layer?
- LPCVD (Low Pressure Chemical Vapor Deposition) – coatings are characterized by low thermal conductivity, cleanliness and repeatability of deposition.
- PECVD (Plasma-Enhanced Chemical Vapor Deposition) – coatings are growing faster, which causes them to be thicker in comparison to LPCVD method.
Silicon nitride wafer specification
| Thickness range | up to 1.3 µm |
| Thickness tolerance | +/-5% |
| Surface finishing | double/single sided polishing |
| Diameter ranging | 2”,3”,4”,6”,8”,12″ |
| Types | standard and low stress |
| Refractive index | 1.46-2.0 |